Remote PECVD : a Route to Controllable Plasma Deposition
نویسندگان
چکیده
منابع مشابه
Remote PECVD: a Route to Controllable Plasma Deposition
Some aspects of RF remote plasma enhanced CVD including the main features of the technique, possibilities of overcoming disadvantages typical for conventional plasma processes, and possible directions to improve the remote plasma method are discussed.
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Copyright 2012 KIEEME. All rights reserved. This is an open-access article distributed under the terms of the Creative Commons Attribution Non-Commercial License (http://creativecommons.org/licenses/by-nc/3.0) which permits unrestricted noncommercial use, distribution, and reproduction in any medium, provided the original work is properly cited. pISSN: 1229-7607 eISSN: 2092-7592 DOI: http://dx...
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ژورنال
عنوان ژورنال: Le Journal de Physique IV
سال: 1995
ISSN: 1155-4339
DOI: 10.1051/jphyscol:1995568